Heterointerface effects on the charging energy of the shallow D ground state in silicon: Role of dielectric mismatch

M. J. Calderón, J. Verduijn, G. P. Lansbergen, G. C. Tettamanzi, S. Rogge, and Belita Koiller
Phys. Rev. B 82, 075317 – Published 17 August 2010

Abstract

Donor states in Si nanodevices can be strongly modified by nearby insulating barriers and metallic gates. Experimental results indicate a strong reduction in the charging energy of isolated As dopants in Si nonplanar field effect transistors relative to the bulk value. By studying the problem of two electrons bound to a shallow donor within the effective mass approach, we find that the measured reduction in the charging energy (measurements also presented here) may be due to a combined effect of the insulator screening and the proximity of metallic gates.

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  • Received 7 May 2010

DOI:https://doi.org/10.1103/PhysRevB.82.075317

©2010 American Physical Society

Authors & Affiliations

M. J. Calderón1, J. Verduijn2, G. P. Lansbergen2, G. C. Tettamanzi2, S. Rogge2, and Belita Koiller3

  • 1Instituto de Ciencia de Materiales de Madrid (CSIC), Cantoblanco, 28049 Madrid, Spain
  • 2Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands
  • 3Instituto de Física, Universidade Federal do Rio de Janeiro, Caixa Postal 68528, 21941-972 Rio de Janeiro, RJ, Brazil

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Vol. 82, Iss. 7 — 15 August 2010

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