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Topological metal at the surface of an ultrathin Bi1xSbx alloy film

T. Hirahara, Y. Sakamoto, Y. Saisyu, H. Miyazaki, S. Kimura, T. Okuda, I. Matsuda, S. Murakami, and S. Hasegawa
Phys. Rev. B 81, 165422 – Published 15 April 2010

Abstract

We have studied the growth and electronic/transport properties of ultrathin Bi1xSbx alloy films, which the bulk is reported to be a topological insulator for 0.07<x<0.22. We found that single crystal epitaxial films as thin as 30Å could be grown on silicon for 0x<0.32. The Z2 topological number of the films was shown to be nontrivial from the surface Fermi surface. Moreover a crossover from an insulating to a metallic behavior was observed upon reducing the film thickness, revealing the clear detection of the topological-metal conductivity. Our results settle the controversial issues concerning the metallicity of Bi1xSbx at low temperature and verify that the surface/volume ratio must be extensively enhanced to properly understand the nature of these surface states.

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  • Received 28 January 2010

DOI:https://doi.org/10.1103/PhysRevB.81.165422

©2010 American Physical Society

Authors & Affiliations

T. Hirahara1,*, Y. Sakamoto1, Y. Saisyu1, H. Miyazaki2, S. Kimura2, T. Okuda3,†, I. Matsuda3, S. Murakami4, and S. Hasegawa1

  • 1Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan
  • 2UVSOR Facility, Institute for Molecular Science, Okazaki 444-8585, Japan
  • 3Synchrotron Radiation Laboratory, ISSP, University of Tokyo, Kashiwa 277-8581, Japan
  • 4Department of Physics, Tokyo Institute of Technology, Tokyo 152-8551, Japan

  • *hirahara@surface.phys.s.u-tokyo.ac.jp
  • Present address: HSRC, Hiroshima University, Higashi-Hiroshima 739-0046, Japan.

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Issue

Vol. 81, Iss. 16 — 15 April 2010

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