Quasiparticle calculations of the electronic properties of ZrO2 and HfO2 polymorphs and their interface with Si

Myrta Grüning, Riad Shaltaf, and Gian-Marco Rignanese
Phys. Rev. B 81, 035330 – Published 21 January 2010

Abstract

Quasiparticle calculations are performed to investigate the electronic band structures of various polymorphs of Hf and Zr oxides. The corrections with respect to density-functional-theory results are found to depend only weakly on the crystal structure. Based on these bulk calculations as well as those for bulk Si, the effect of quasiparticle corrections is also investigated for the band offsets at the interface between these oxides and Si assuming that the lineup of the potential at the interface is reproduced correctly within density-functional theory. On the one hand, the valence-band offsets are practically unchanged with a correction of a few tenths of electron volts. On the other hand, conduction-band offsets are raised by 1.3–1.5 eV. When applied to existing calculations for the offsets at the density-functional-theory level, our quasiparticle corrections provide results in good agreement with the experiment.

  • Figure
  • Received 24 September 2009

DOI:https://doi.org/10.1103/PhysRevB.81.035330

©2010 American Physical Society

Authors & Affiliations

Myrta Grüning*, Riad Shaltaf, and Gian-Marco Rignanese

  • European Theoretical Spectroscopy Facility (ETSF) and Unité PCPM, Université Catholique de Louvain, Place Croix du Sud 1, 1348 Louvain-la-Neuve, Belgium

  • *Present address: Centre for Computational Physics and Physics Department, University of Coimbra, Rua Larga 3004-516 Coimbra, Portugal.
  • Present address: Department of Physics, University of Jordan, 11942 Amman, Jordan.

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Issue

Vol. 81, Iss. 3 — 15 January 2010

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