First-principles study of the formation and migration of native defects in NaAlH4

Gareth B. Wilson-Short, Anderson Janotti, Khang Hoang, Amra Peles, and Chris G. Van de Walle
Phys. Rev. B 80, 224102 – Published 4 December 2009
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Abstract

We present a first-principles study of native defects in NaAlH4. Our analysis indicates that the structure and energetics of these defects can be interpreted in terms of elementary building blocks, which include VAlH4+, VNa, VH+, Hi, and (H2)i. We also calculate migration barriers for several key defects, in order to compare enthalpies of diffusion to experimentally measured activation energies of desorption. From this, we estimate activation energies for the diffusion of defects and defect pairs. We suggest that VAlH4+ and Hi, or VNa and VH+, may be responsible for diffusion necessary for desorption. We discuss the possible role of VH+-Hi complex formation. The values we find are in the range of activation energies reported for catalyzed desorption.

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  • Received 9 July 2009

DOI:https://doi.org/10.1103/PhysRevB.80.224102

©2009 American Physical Society

Authors & Affiliations

Gareth B. Wilson-Short, Anderson Janotti, Khang Hoang, Amra Peles*, and Chris G. Van de Walle

  • Materials Department, University of California, Santa Barbara, California 93106-5050, USA

  • *Present address: United Technologies Research Center, 411 Silver Lane, MS 129-90, East Hartford, CT 06108.
  • Corresponding author. vandewalle@mrl.ucsb.edu

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Issue

Vol. 80, Iss. 22 — 1 December 2009

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