Scaling of spin relaxation and angular momentum dissipation in permalloy nanowires

T. A. Moore, M. Kläui, L. Heyne, P. Möhrke, D. Backes, J. Rhensius, U. Rüdiger, L. J. Heyderman, J.-U. Thiele, G. Woltersdorf, C. H. Back, A. Fraile Rodríguez, F. Nolting, T. O. Mentes, M. Á. Niño, A. Locatelli, A. Potenza, H. Marchetto, S. Cavill, and S. S. Dhesi
Phys. Rev. B 80, 132403 – Published 14 October 2009

Abstract

We study the relationship between the damping (α) and the nonadiabaticity of the spin transport (β) in permalloy nanowires. α is engineered by Ho doping, and from the characteristics of the current-induced domain-wall velocity, determined by high-resolution x-ray magnetic circular-dichroism photoemission electron microscopy, β due to spin relaxation is measured. We find that β scales with α and conclude that the spin relaxation that leads to nonadiabatic spin torque originates from the same underlying mechanism as the angular momentum dissipation that causes viscous damping.

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  • Received 23 September 2009

DOI:https://doi.org/10.1103/PhysRevB.80.132403

©2009 American Physical Society

Authors & Affiliations

T. A. Moore1,*, M. Kläui1, L. Heyne1, P. Möhrke1, D. Backes1,†, J. Rhensius1,†, U. Rüdiger1, L. J. Heyderman2, J.-U. Thiele3, G. Woltersdorf4, C. H. Back4, A. Fraile Rodríguez5, F. Nolting5, T. O. Mentes6, M. Á. Niño6, A. Locatelli6, A. Potenza7, H. Marchetto7, S. Cavill7, and S. S. Dhesi7

  • 1Fachbereich Physik, Universität Konstanz, Universitätsstrasse 10, 78457 Konstanz, Germany
  • 2Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland
  • 3Hitachi Global Storage Technologies, San Jose Research Center, San Jose, California 95135, USA
  • 4Fakultät für Physik, Universität Regensburg, Universitätsstrasse 31, 93040 Regensburg, Germany
  • 5Swiss Light Source, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland
  • 6Sincrotrone Trieste, Basovizza, 34012 Trieste, Italy
  • 7Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire OX11 0DE, United Kingdom

  • *Present address: Institut Néel, CNRS and UJF, B.P. 166, 38042 Grenoble Cedex 9, France; t.a.moore@physics.org
  • Also at Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland.

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Issue

Vol. 80, Iss. 13 — 1 October 2009

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