Band dispersion near the Fermi level for VO2 thin films grown on TiO2 (001) substrates

K. Saeki, T. Wakita, Y. Muraoka, M. Hirai, T. Yokoya, R. Eguchi, and S. Shin
Phys. Rev. B 80, 125406 – Published 10 September 2009

Abstract

We have performed angle-resolved photoemission spectroscopy (ARPES) measurements of VO2 using epitaxial thin films and observed the band dispersion near the Fermi level (EF) for this compound. The VO2 thin films have been grown on TiO2 (001) single-crystal substrates using pulsed laser deposition. The films exhibit a first-order metal-insulator transition (MIT) at 305 K. In the ARPES spectra of the metallic phase for the films, the O2p band shows highly dispersive features in the binding-energy range of 3–8 eV along the ΓZ direction. Also, the V3d state shows two dispersive bands around the Γ point near EF, indicative of two electron pockets centered at the Γ point. Both electron pockets have an occupied bandwidth of about 0.4 eV. Assuming the parabolic energy bands around the Γ point, the effective-mass ratios of the two electron pockets are estimated to be about 0.2 and 1. The present work indicates that the ARPES measurements using epitaxial thin films are promising for determining the band structure of VO2 and thus would play a crucial role to elucidate the mechanism of the MIT in VO2.

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  • Received 7 May 2009

DOI:https://doi.org/10.1103/PhysRevB.80.125406

©2009 American Physical Society

Authors & Affiliations

K. Saeki1, T. Wakita2, Y. Muraoka1,2, M. Hirai1,2, T. Yokoya1,2, R. Eguchi3, and S. Shin3

  • 1Graduate School of Natural Science and Technology, Okayama University, 3-1-1 Tsushima-naka, Tsushima, Kita-ku, Okayama 700-8530, Japan
  • 2Faculty of Science, Research Laboratory for Surface Science, Okayama University, 3-1-1 Tsushima-naka, Tsushima, Kita-ku, Okayama 700-8530, Japan
  • 3RIKEN/SPring-8, 1-1-1 Kouto, Sayo, Hyogo 679-5148, Japan

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Issue

Vol. 80, Iss. 12 — 15 September 2009

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