Hall carrier density and magnetoresistance measurements in thin-film vanadium dioxide across the metal-insulator transition

Dmitry Ruzmetov, Don Heiman, Bruce B. Claflin, Venkatesh Narayanamurti, and Shriram Ramanathan
Phys. Rev. B 79, 153107 – Published 20 April 2009

Abstract

Temperature-dependent magnetotransport measurements in magnetic fields of up to 12 T were performed on thin-film vanadium dioxide (VO2) across the metal-insulator transition (MIT). The Hall carrier density increases by 4 orders of magnitude at the MIT and accounts almost entirely for the resistance change. The Hall mobility varies little across the MIT and remains low, 0.1cm2/Vsec. Electrons are found to be the major carriers on both sides of the MIT. Small positive magnetoresistance in the semiconducting phase is measured.

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  • Received 5 January 2009

DOI:https://doi.org/10.1103/PhysRevB.79.153107

©2009 American Physical Society

Authors & Affiliations

Dmitry Ruzmetov1, Don Heiman2, Bruce B. Claflin3, Venkatesh Narayanamurti1, and Shriram Ramanathan1

  • 1Harvard School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA
  • 2Department of Physics, Northeastern University, Boston, Massachusetts 02115, USA
  • 3Semiconductor Research Center, Wright State University, Dayton, Ohio 45435, USA

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Issue

Vol. 79, Iss. 15 — 15 April 2009

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