Optical properties and magnetochromism in multiferroic BiFeO3

X. S. Xu, T. V. Brinzari, S. Lee, Y. H. Chu, L. W. Martin, A. Kumar, S. McGill, R. C. Rai, R. Ramesh, V. Gopalan, S. W. Cheong, and J. L. Musfeldt
Phys. Rev. B 79, 134425 – Published 21 April 2009

Abstract

In order to investigate spin-charge coupling in multiferroic oxides, we measured the optical properties of BiFeO3. Although the direct 300 K charge gap is observed at 2.67 eV, absorption onset actually occurs at much lower energy with Fe3+ excitations at 1.41 and 1.90 eV. Temperature and magnetic-field-induced spectral changes reveal complex interactions between on-site crystal-field and magnetic excitations in the form of magnon sidebands. We employ the sensitivity of these magnon sidebands to map out the magnetic-field-temperature phase diagram which demonstrates optical evidence for spin spiral quenching above 20 T and suggests a spin domain reorientation near 10 T.

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  • Received 17 February 2009

DOI:https://doi.org/10.1103/PhysRevB.79.134425

©2009 American Physical Society

Authors & Affiliations

X. S. Xu1, T. V. Brinzari1, S. Lee2, Y. H. Chu3, L. W. Martin3,4, A. Kumar5, S. McGill6, R. C. Rai1,*, R. Ramesh3,4, V. Gopalan5, S. W. Cheong2, and J. L. Musfeldt1

  • 1Department of Chemistry, University of Tennessee, Knoxville, Tennessee 37996, USA
  • 2Rutgers Center for Emergent Materials and Department of Physics, Rutgers University, Piscataway, New Jersey 08854, USA
  • 3Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, California 94720, USA and Department of Materials Science and Engineering, National Chiao Tung University, HsinChu, Taiwan 30010
  • 4Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  • 5Department of Materials Science and Engineering, Pennsylvania State University, University Park, Pennsylvania 16802, USA
  • 6National High Magnetic Field Laboratory, Tallahassee, Florida 32310, USA

  • *Department of Physics, Buffalo State College, Buffalo, NY 14222, USA.

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Issue

Vol. 79, Iss. 13 — 1 April 2009

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