Contact resistance and shot noise in graphene transistors

J. Cayssol, B. Huard, and D. Goldhaber-Gordon
Phys. Rev. B 79, 075428 – Published 17 February 2009

Abstract

Potential steps naturally develop in graphene near metallic contacts. We investigate the influence of these steps on the transport in graphene field effect transistors. We give simple expressions to estimate the voltage-dependent contribution of the contacts to the total resistance and noise in the diffusive and ballistic regimes.

  • Figure
  • Figure
  • Figure
  • Figure
  • Received 20 December 2008

DOI:https://doi.org/10.1103/PhysRevB.79.075428

©2009 American Physical Society

Authors & Affiliations

J. Cayssol

  • CPMOH, UMR 5798, Université de Bordeaux, 33405 Talence, France

B. Huard

  • Department of Physics, Stanford University, Stanford, California, USA and Laboratoire Pierre Aigrain, Département de Physique de l’Ecole Normale Supérieure 24 rue Lhomond, 75231 Paris Cedex 05, France

D. Goldhaber-Gordon

  • Department of Physics, Stanford University, Stanford, California, USA

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 79, Iss. 7 — 15 February 2009

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×