Near-zero-moment ferromagnetism in the semiconductor SmN

C. Meyer, B. J. Ruck, J. Zhong, S. Granville, A. R. H. Preston, G. V. M. Williams, and H. J. Trodahl
Phys. Rev. B 78, 174406 – Published 6 November 2008

Abstract

The magnetic behavior of SmN has been investigated in stoichiometric polycrystalline films. All samples show ferromagnetic order with Curie temperature (TC) of 27±3K, evidenced by the occurrence of hysteresis below TC. The ferromagnetic state is characterized by a very small moment and a large coercive field, exceeding even the maximum applied field of 6 T below about 15 K. The residual magnetization at 2 K, measured after cooling in the maximum field, is 0.035μB per Sm. Such a remarkably small moment results from a near cancellation of the spin and orbital contributions for Sm+3 in SmN. Coupling to an applied field is therefore weak, explaining the huge coercive field. The susceptibility in the paramagnetic phase shows temperature-independent Van Vleck and Curie-Weiss contributions. The Van Vleck contribution is in quantitative agreement with the field-induced admixture of the J=72 excited state and the 52 ground state. The Curie-Weiss contribution returns a Curie temperature that agrees with the onset of ferromagnetic hysteresis, and a conventional paramagnetic moment with an effective moment of 0.4μB per Sm ion, in agreement with expectations for the crystal-field modified effective moment on the Sm+3 ions.

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  • Received 16 October 2008

DOI:https://doi.org/10.1103/PhysRevB.78.174406

©2008 American Physical Society

Authors & Affiliations

C. Meyer1,2, B. J. Ruck1,*, J. Zhong1, S. Granville1, A. R. H. Preston1, G. V. M. Williams3, and H. J. Trodahl1,4

  • 1The MacDiarmid Institute for Advanced Materials and Nanotechnology, School of Chemical and Physical Sciences, Victoria University, P.O. Box 600, Wellington 6140, New Zealand
  • 2Institut Néel, CNRS-UJF, BP 166, 38042 Grenoble, France
  • 3The MacDiarmid Institute for Advanced Materials and Nanotechnology, Industrial Research Ltd., P.O. Box 31310, Lower Hutt 5040, New Zealand
  • 4Ceramics Laboratory, EPFL-Swiss Federal Institute of Technology, Lausanne 1015, Switzerland

  • *ben.ruck@vuw.ac.nz

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Issue

Vol. 78, Iss. 17 — 1 November 2008

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