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Pit formation during graphene synthesis on SiC(0001): In situ electron microscopy

J. B. Hannon and R. M. Tromp
Phys. Rev. B 77, 241404(R) – Published 26 June 2008

Abstract

We have studied the formation of graphene on the Si face of SiC(0001)-6H and -4H using in situ electron microscopy. By imaging the nucleation and growth of the 63 “buffer layer” during annealing in vacuum we identify key factors responsible for the appearance of deep pits during graphene formation. Pits form because domains of the buffer layer pin decomposing surface steps. Graphene is observed to nucleate in the pits, where the step density is high.

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  • Received 28 April 2008

DOI:https://doi.org/10.1103/PhysRevB.77.241404

©2008 American Physical Society

Authors & Affiliations

J. B. Hannon* and R. M. Tromp

  • IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598, USA

  • *jbhannon@us.ibm.com

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Issue

Vol. 77, Iss. 24 — 15 June 2008

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