Effect of strain and electric field on the electronic soft matter in manganite thin films

Tara Dhakal, Jacob Tosado, and Amlan Biswas
Phys. Rev. B 75, 092404 – Published 21 March 2007

Abstract

We have studied the effect of substrate-induced strain on the properties of thin films of the hole-doped manganite (La1yPry)0.67Ca0.33MnO3 (y=0.4, 0.5, and 0.6) grown on NdGaO3 (NGO) substrates, in order to distinguish between the roles played by long-range strain interactions and quenched atomic disorder in forming the micrometer-scale phase separated state. We show that a fluid phase separated (FPS) state is formed at intermediate temperatures similar to the strain-liquid state in bulk compounds, which can be converted to a metallic state by applying an external electric field. In contrast to bulk compounds, at low temperatures a strain stabilized ferromagnetic metallic (FMM) state is formed in the y=0.4 and 0.5 samples. However, in the y=0.6 sample a static phase separated (SPS) state is formed similar to the strain-glass phase in bulk compounds. Our results suggest that the substrate-induced strain is a function of temperature. Hence, we show that the temperature induced variation of the long-range strain interactions plays a dominant role in determining the properties of thin films of phase-separated manganites.

  • Figure
  • Figure
  • Figure
  • Received 24 July 2006

DOI:https://doi.org/10.1103/PhysRevB.75.092404

©2007 American Physical Society

Authors & Affiliations

Tara Dhakal, Jacob Tosado, and Amlan Biswas

  • Department of Physics, University of Florida, Gainesville, Florida 32611, USA

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 75, Iss. 9 — 1 March 2007

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×