Adsorption of hydrogen on clean and modified magnesium films

Martin Johansson, Christopher W. Ostenfeld, and Ib Chorkendorff
Phys. Rev. B 74, 193408 – Published 14 November 2006

Abstract

The sticking of hydrogen on 400Å thick magnesium films, grown under ultrahigh vacuum conditions, have been measured under conditions relevant for hydrogen storage, i.e., elevated temperatures and pressures. A model which describes the hydrogenation and desorption kinetics of the pure magnesium films at H/Mg ratios less than 2% is developed. The activation barrier for hydrogen dissociation is 72±15kJmole H2, and a stagnant hydrogen uptake is observed. For platinum-catalyzed films, the barrier is significantly reduced, and there is no stagnation in the uptake rate.

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  • Received 7 August 2006

DOI:https://doi.org/10.1103/PhysRevB.74.193408

©2006 American Physical Society

Authors & Affiliations

Martin Johansson, Christopher W. Ostenfeld, and Ib Chorkendorff*

  • Danish National Research Foundation’s Center for Individual Nanoparticle Functionality (CINF) and Nano DTU, Department of Physics, Technical University of Denmark, DK-2800 Kgs. Lyngby, Denmark

  • *Electronic address: ibchork@fysik.dtu.dk

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Issue

Vol. 74, Iss. 19 — 15 November 2006

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