Structural and dielectric properties of amorphous ZrO2 and HfO2

Davide Ceresoli and David Vanderbilt
Phys. Rev. B 74, 125108 – Published 13 September 2006

Abstract

Zirconia (ZrO2) and hafnia (HfO2) are leading candidates for replacing SiO2 as the gate insulator in complementary metal-oxide semiconductor technology. Amorphous versions of these materials (aZrO2 and aHfO2) can be grown as metastable phases on top of a silicon buffer; while they tend to recrystallize during subsequent annealing steps, they would otherwise be of considerable interest because of the promise they hold for improved uniformity and electrical passivity. In this work, we report our theoretical studies of aZrO2 and aHfO2 by first-principles density-functional methods. We construct realistic amorphous models using the “activation-relaxation” technique of Barkema and Mousseau. The structural, vibrational, and dielectric properties of the resulting models are analyzed in detail. The overall average dielectric constant is computed and found to be comparable to that of the monoclinic phase.

    • Received 13 June 2006

    DOI:https://doi.org/10.1103/PhysRevB.74.125108

    ©2006 American Physical Society

    Authors & Affiliations

    Davide Ceresoli* and David Vanderbilt

    • Department of Physics and Astronomy, Rutgers University, 136 Frelinghuysen Road, Piscataway, New Jersey 08854, USA

    • *Present address: Scuola Internazionale Superiore di Studi Avanzati (SISSA) and DEMOCRITOS, via Beirut 2-4, I-34014 Trieste, Italy.

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    Issue

    Vol. 74, Iss. 12 — 15 September 2006

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