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Topological defects in the edge-state structure in a bilayer electron system

E. V. Deviatov, V. T. Dolgopolov, A. Würtz, A. Lorke, A. Wixforth, W. Wegscheider, K. L. Campman, and A. C. Gossard
Phys. Rev. B 72, 041305(R) – Published 14 July 2005

Abstract

We experimentally demonstrate formation of pointlike topological defects in the edge-state structure in the quantum Hall effect regime. By using of a selective population technique, we investigate equilibration processes between the edge states in bilayer electron structures with a high tunneling rate between layers. Unexpected flattening of the IV curves in a perpendicular magnetic field at a specific filling factor combination and the recovery of the conventional nonlinear IV characteristics in tilted fields give a strong evidence for the existence of topological defects.

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  • Received 18 March 2005

DOI:https://doi.org/10.1103/PhysRevB.72.041305

©2005 American Physical Society

Authors & Affiliations

E. V. Deviatov1,*, V. T. Dolgopolov1, A. Würtz2, A. Lorke2, A. Wixforth3, W. Wegscheider4, K. L. Campman5, and A. C. Gossard5

  • 1Institute of Solid State Physics RAS, Chernogolovka, Moscow District 142432, Russia
  • 2Laboratorium für Festkörperphysik, Universität Duisburg-Essen, Lotharstrasse 1, D-47048 Duisburg, Germany
  • 3Institut für Physik, Universitat Augsburg, Universitatsstrasse, 1 D-86135 Augsburg, Germany
  • 4Institut für Angewandte und Experimentelle Physik, Universitat Regensburg, 93040 Regensburg, Germany
  • 5Materials Department and Center for Quantized Electronic Structures, University of California, Santa Barbara, California 93106, USA

  • *Corresponding author. Electronic address: dev@issp.ac.ru

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Issue

Vol. 72, Iss. 4 — 15 July 2005

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