Abstract
The temperature range of helical antiferromagnetic (AFM) order in epitaxially grown Tb metal films on W(110) was studied via ac susceptibility using the magneto-optical Kerr effect. The temperature range of the AFM phase was found to get wider with increasing annealing temperature, reaching a maximum width of 17 K when the film is annealed at . This shows that the AFM phase is stabilized in epitaxial films as compared to bulk Tb metal. Annealing-induced changes of the surface topography of the films were monitored by scanning tunnel microscope and low-eneregy electron diffraction, revealing a statistical surface roughness for and the formation of large terraces separated by monatomic steps for . Annealing above results in step bunching, followed by a breakup of the film for . Both the extension of the AFM phase in the film and the annealing-induced changes of the surface topography can be explained by assuming the presence of a reconstructed Tb monolayer at the film-substrate interface that serves as an effective substrate on which a slightly strained Tb film lattice is stabilized upon annealing.
- Received 17 December 2004
DOI:https://doi.org/10.1103/PhysRevB.72.035417
©2005 American Physical Society