Three-dimensional photonic crystals by holographic lithography using the umbrella configuration: Symmetries and complete photonic band gaps

D. C. Meisel, M. Wegener, and K. Busch
Phys. Rev. B 70, 165104 – Published 13 October 2004

Abstract

We present a detailed study of the crystallographic symmetries and band structures of three-dimensional photonic crystals that are amenable to nanofabrication through holographic lithography. For the experimentally preferable umbrella geometry, we identify realistic parameters that lead to structures with complete three-dimensional photonic band gaps. We find a solution, for which the photonic crystals have rhombohedral point symmetry. This solution is a member of the same space group as the celebrated Yablonovite structure and has a similar crystallographic motif. We find a complete photonic band gap with a gap/midgap ratio of 5.8% between the second and third band after silicon inversion at 38% silicon filling fraction. In addition, we identify parameter combinations for which the optimized interference contrast is as large as a factor of 10, rendering the fabrication of this structure possible.

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  • Received 20 April 2004

DOI:https://doi.org/10.1103/PhysRevB.70.165104

©2004 American Physical Society

Authors & Affiliations

D. C. Meisel*

  • Institut für Nanotechnologie, Forschungszentrum Karlsruhe in der Helmholtz-Gemeinschaft, D-76021 Karlsruhe, Germany

M. Wegener

  • Institut für Angewandte Physik, Universität Karlsruhe (TH), D-76128 Karlsruhe, Germany

K. Busch

  • Institut für Theorie der Kondensierten Materie, Universität Karlsruhe (TH), D-76128 Karlsruhe, Germany and Department of Physics and School of Optics: CREOL & FPCE, University of Central Florida, Orlando, Florida 32816, USA

  • *Email address: daniel.meisel@physik.uni-karlsruhe.de

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Issue

Vol. 70, Iss. 16 — 15 October 2004

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