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Evidence for a structurally-driven insulator-to-metal transition in VO2: A view from the ultrafast timescale

A. Cavalleri, Th. Dekorsy, H. H. W. Chong, J. C. Kieffer, and R. W. Schoenlein
Phys. Rev. B 70, 161102(R) – Published 13 October 2004

Abstract

We apply ultrafast spectroscopy to establish a time-domain hierarchy between structural and electronic effects in a strongly correlated electron system. We discuss the case of the model system VO2, a prototypical nonmagnetic compound that exhibits cell doubling, charge localization, and a metal-insulator transition below 340 K. We initiate the formation of the metallic phase by prompt hole photo-doping into the valence band of the low-T insulator. The insulator-to-metal transition is, however, delayed with respect to hole injection, exhibiting a bottleneck time scale, associated with the phonon connecting the two crystallographic phases. This structural bottleneck is observed despite faster depletion of the d bands and is indicative of important bandlike character for this controversial insulator.

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  • Received 4 September 2003

DOI:https://doi.org/10.1103/PhysRevB.70.161102

©2004 American Physical Society

Authors & Affiliations

A. Cavalleri1,*, Th. Dekorsy2, H. H. W. Chong1, J. C. Kieffer3, and R. W. Schoenlein1

  • 1Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California, USA
  • 2Forschungszentrum Rossendorf, Dresden, Germany
  • 3INRS énergie et matériaux, Université du Québec, Varennes, Québec, Canada

  • *Corresponding author. Email address: ACavalleri@lbl.gov

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Vol. 70, Iss. 16 — 15 October 2004

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