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Contributions of the escape depth to the photoelectron intensity of a well-defined initial state

M. Morgenstern, T. Strasser, R. Adelung, M. Getzlaff, L. Kipp, M. Skibowski, W. Schattke, and R. Wiesendanger
Phys. Rev. B 70, 081305(R) – Published 25 August 2004

Abstract

Using the adsorbate-induced two-dimensional electron system on InAs(110) as an initial state, which provides rather small energy and k-space distribution, we measure the photoelectron intensity as a function of photoelectron energy. It oscillates twice between 3eV and 23eV having maxima at 5.5eV and 19eV. Comparison with calculations performed within the one-step model shows that the maximum at low energy is due to an overlap of a maximum in the photoelectron escape depth and a maximum of the matrix elements corresponding to the atomic wave functions. In contrast, the maximum at high energy is caused by final states crossing the Γ point exactly at this energy. The comparison confirms the theoretical prediction that the escape depth at low excitation energies can be significantly modified by band-structure effects.

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  • Received 19 April 2004

DOI:https://doi.org/10.1103/PhysRevB.70.081305

©2004 American Physical Society

Authors & Affiliations

M. Morgenstern1, T. Strasser2, R. Adelung3, M. Getzlaff4, L. Kipp3, M. Skibowski3, W. Schattke2,5, and R. Wiesendanger1

  • 1Institute of Applied Physics, Hamburg University, Jungiusstraße 11, D-20355 Hamburg, Germany
  • 2Institut für Theoretische Physik und Astrophysik, Christian-Albrechts-Universität, Leibnizstraße 15, D-24098 Kiel, Germany
  • 3Institute for Experimental and Applied Physics, Christian-Albrechts-University, Leibnizstraße 19, D-24098 Kiel, Germany
  • 4Institute of Applied Physics, University of Düsseldorf, Universitätsstr. 1, D-40225 Düsseldorf, Germany
  • 5Donostia International Physics Center (DIPC), Manuel de Lardizabal 4, E-20018 San Sebastian, Spain

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Issue

Vol. 70, Iss. 8 — 15 August 2004

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