Absence of low-temperature phase transitions in epitaxial BaTiO3 thin films

D. A. Tenne, X. X. Xi, Y. L. Li, L. Q. Chen, A. Soukiassian, M. H. Zhu, A. R. James, J. Lettieri, D. G. Schlom, W. Tian, and X. Q. Pan
Phys. Rev. B 69, 174101 – Published 3 May 2004
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Abstract

We have studied phase transitions in epitaxial BaTiO3 thin films by Raman spectroscopy. The films are found to remain in a single ferroelectric phase over the temperature range from 5 to 325 K. The low-temperature phase transitions characteristic of bulk BaTiO3 (tetragonal-orthorhombic-rhombohedral) are absent in the films. X-ray diffraction shows that the BaTiO3 films are under tensile strain due to the thermal expansion mismatch with the buffer layer. A phase-field calculation of the phase diagram and domain structures in BaTiO3 thin films predicts, without any priori assumption, that an orthorhombic phase with in-plane polarization is the thermodynamically stable phase for such values of tensile strain and temperature, consistent with the experimental Raman results.

  • Received 14 January 2004

DOI:https://doi.org/10.1103/PhysRevB.69.174101

©2004 American Physical Society

Authors & Affiliations

D. A. Tenne1,*, X. X. Xi1,2,3, Y. L. Li2, L. Q. Chen2,3, A. Soukiassian2, M. H. Zhu1,†, A. R. James1,‡, J. Lettieri2, D. G. Schlom2,3, W. Tian4, and X. Q. Pan4

  • 1Department of Physics, the Pennsylvania State University, University Park, Pennsylvania 16802, USA
  • 2Department of Materials Science and Engineering, the Pennsylvania State University, University Park, Pennsylvania 16802, USA
  • 3Materials Research Institute, the Pennsylvania State University, University Park, Pennsylvania 16802, USA
  • 4Department of Materials Science and Engineering, the University of Michigan, Ann Arbor, Michigan 48109, USA

  • *Electronic address: dat10@psu.edu; On leave from the Institute of Semiconductor Physics, Novosibirsk, Russia.
  • Currently at Tsinghua University, Beijing, China.
  • Current address: Solid State Physics Laboratory, Lucknow Rd., Timarpur, Delhi-110 054, India.

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Vol. 69, Iss. 17 — 1 May 2004

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