Surface morphology and ionization potentials of polar semiconductors: The case of GaAs

C. Sgiarovello, N. Binggeli, and A. Baldereschi
Phys. Rev. B 69, 035320 – Published 27 January 2004
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Abstract

Using an ab initio pseudopotential approach, we have studied the ionization potential of several surfaces of GaAs, with different orientation, reconstruction, and stoichiometry. In particular, we have examined the As-rich (100) c(4×4), (2×4)2β, and (2×4)β surfaces, the Ga-rich (100) (4×2)2β and (4×2)ζ surfaces, as well as the (110) surface. The calculated variations of the ionization potential with surface morphology are as large as 0.7 eV. The largest ionization potential (5.70 eV) occurs for the As-rich (2×4)β surface, and the smallest (5.00 eV) for the Ga-rich (4×2)2β one. The results are compared with available experimental data, and are explained in terms of a model based on a superposition of neutral bulk charge-density units, carrying neither dipole nor quadrupole, and charge transfers between the units dictated by the electron counting rule.

  • Received 1 September 2003

DOI:https://doi.org/10.1103/PhysRevB.69.035320

©2004 American Physical Society

Authors & Affiliations

C. Sgiarovello

  • Institut Romand de Recherche Numérique en Physique des Materiaux (IRRMA), CH–1015 Lausanne, Switzerland

N. Binggeli

  • International Center for Theoretical Physics (ICTP) and INFM DEMOCRITOS National Simulation Center, Strada Costiera 11, I-34014 Trieste, Italy

A. Baldereschi

  • Institut Romand de Recherche Numérique en Physique des Matériaux (IRRMA) and Institute of Theoretical Physics, EPFL, CH-1015 Lausanne, Switzerland
  • Dipartimento di Fisica Teorica and INFM, Universitá di Trieste, I-34014 Trieste, Italy

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Vol. 69, Iss. 3 — 15 January 2004

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