Schottky barrier heights at polar metal/semiconductor interfaces

C. Berthod, N. Binggeli, and A. Baldereschi
Phys. Rev. B 68, 085323 – Published 22 August 2003
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Abstract

Using a first-principle pseudopotential approach, we have investigated the Schottky barrier heights of abrupt Al/Ge, Al/GaAs, Al/AlAs, and Al/ZnSe (100) junctions, and their dependence on the semiconductor chemical composition and surface termination. A model based on linear-response theory is developed, which provides a simple, yet accurate description of the barrier-height variations with the chemical composition of the semiconductor. The larger barrier values found for the anion-terminated surface than for the cation-terminated surface are explained in terms of the screened charge of the polar semiconductor surface and its image charge at the metal surface. Atomic-scale computations show how the classical image charge concept, valid for charges placed at large distances from the metal, extends to distances shorter than the decay length of the metal-induced-gap states.

  • Received 28 February 2003

DOI:https://doi.org/10.1103/PhysRevB.68.085323

©2003 American Physical Society

Authors & Affiliations

C. Berthod

  • DPMC, Université de Genève, 24 quai Ernest-Ansermet, CH–1211 Genève 4, Switzerland

N. Binggeli

  • International Center for Theoretical Physics (ICTP) and INFM DEMOCRITOS National Center, Strada Costiera 11, I–34014 Trieste, Italy

A. Baldereschi

  • Institut Romand de Recherche Numérique en Physique des Matériaux (IRRMA), CH–1015 Lausanne, Switzerland

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Vol. 68, Iss. 8 — 15 August 2003

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