High-resolution photoemission study of hydrogen interaction with polar and nonpolar GaAs surfaces

M. Petravic, P. N. K. Deenapanray, B. F. Usher, K.-J. Kim, and B. Kim
Phys. Rev. B 67, 195325 – Published 22 May 2003
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Abstract

We have used synchrotron-based high-resolution core-level photoemission and valence-band emission measurements to characterize hydrogen chemisorption on nonpolar GaAs(110) and polar GaAs(100) and GaAs(001) surfaces. Chemisorbed atomic hydrogen forms both Ga-H and As-H bonds on all three surfaces, causing chemical shifts of core-level binding energies and changing the valence-band emission. For low hydrogen exposures arsenic desorbs from all surfaces. However, at higher exposures, the (110) surface transforms into a Ga-rich structure with traces of metallic Ga, while the (100) surface transforms into an As-rich structure. We have also observed some additional changes in the binding energy of bulk components of Ga and As core levels as a function of hydrogen exposure, which may be explained by hydrogen-induced changes in band bending.

  • Received 18 December 2002

DOI:https://doi.org/10.1103/PhysRevB.67.195325

©2003 American Physical Society

Authors & Affiliations

M. Petravic1,2, P. N. K. Deenapanray1, B. F. Usher3, K.-J. Kim4, and B. Kim4

  • 1Department of Electronic Materials Engineering, Research School of Physical Sciences and Engineering, Australian National University, Canberra ACT 0200, Australia
  • 2Department of Physics, School of Mathematical and Physical Sciences, University of Newcastle, Callaghan NSW 2308, Australia
  • 3Department of Electronic Engineering, La Trobe University, Bundoora Victoria 3083, Australia
  • 4Pohang Light Source, Pohang Accelerator Laboratory, Pohang, Kyungbuk 790-784, Korea

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Vol. 67, Iss. 19 — 15 May 2003

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