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Epitaxial growth of Cu on Cu(001): Experiments and simulations

Itay Furman, Ofer Biham, Jiang-Kai Zuo, Anna K. Swan, and John F. Wendelken
Phys. Rev. B 62, R10649(R) – Published 15 October 2000
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Abstract

A quantitative comparison between experimental and Monte Carlo simulation results for the epitaxial growth of Cu/Cu(001) in the submonolayer regime is presented. The simulations take into account a complete set of hopping processes whose activation energies are derived from semiempirical calculations using the embedded-atom method. The island separation is measured as a function of the incoming flux and the temperature. A good quantitative agreement between the experiment and simulation is found for the island separation, the activation energies for the dominant processes, and the exponents that characterize the growth. The simulation results are then analyzed at lower coverages, which are not accessible experimentally, providing good agreement with theoretical predictions as well.

  • Received 31 July 2000

DOI:https://doi.org/10.1103/PhysRevB.62.R10649

©2000 American Physical Society

Authors & Affiliations

Itay Furman and Ofer Biham

  • Racah Institute of Physics, The Hebrew University, Jerusalem 91904, Israel

Jiang-Kai Zuo*, Anna K. Swan, and John F. Wendelken

  • Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831

  • *Present address: Semiconductor Product Sector, Motorola, Inc., MD-M350, Mesa, AZ 85202.
  • Present address: Department of Electrical and Computer Engineering, Boston University, Boston, MA 02215.

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Vol. 62, Iss. 16 — 15 October 2000

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