Theoretical investigations of bond properties in graphite and graphitic silicon

YuChen Wang, Kurt Scheerschmidt, and Ulrich Gösele
Phys. Rev. B 61, 12864 – Published 15 May 2000
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Abstract

Within the local-density approximation, the interlayer binding and the electronic properties of graphite and “graphitic” Si have been determined. For graphite, the optimized equilibrium lattice constant agrees well with the experimental value. The role of 2pz orbitals (π states) turned out to be twofold: contributing a major part to the binding of C atoms within basal planes, and giving a minor contribution in the form of the overlay of 2pz orbitals, which leads to weaker interlayer binding. The interlayer binding attributed to the interaction of C-C atoms in different layers yields the calculated binding energy as a function of the lattice constants and is applied to fit an additional Lennard-Jones-type empirical potential to be included in classical molecular-dynamics simulations. In contrast to that, the calculated energy pathways for “graphitic” Si show an extended region of minima within the range of a=3.84Å and for c varying from 5.50 to 6.68Å having two lower levels, which indicates chemisorption and physical absorption. The obtained electronic density distribution demonstrates that the atoms in “graphitic” Si tend to form a structure with metal-like electron distributions. Nevertheless, a Lennard-Jones potential with restricted validity may be fitted to describe the weak long-range behavior, too.

  • Received 26 July 1999

DOI:https://doi.org/10.1103/PhysRevB.61.12864

©2000 American Physical Society

Authors & Affiliations

YuChen Wang

  • Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle, Germany
  • Laboratory of Atomic Imaging of Solids, Chinese Academy of Sciences, Shenyang 110015, People’s Republic China

Kurt Scheerschmidt* and Ulrich Gösele

  • Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle, Germany

  • *Author to whom all correspondence should be addressed. FAX: +49-0345-5582917. Electronic address: schee@mpi-halle.de, http:\\www.mpi-halle.de

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Vol. 61, Iss. 19 — 15 May 2000

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