Electrical band-gap energy of porous silicon and the band offsets at the porous-silicon/crystalline-silicon heterojunction measured versus sample temperature

J. T. Frederiksen, P. G. Melcher, and E. Veje
Phys. Rev. B 58, 8020 – Published 15 September 1998
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Abstract

Photocurrent measurements have been carried out on a series of samples consisting of porous silicon on top of crystalline silicon, in the temperature range 10–300 K. From the experimental data set, the electrical band-gap energy of porous silicon is deduced to be (1.80±0.01)eV, independent of sample temperature. In contrast to this, some temperature variations are observed for the band offsets, reflecting qualitatively the temperature dependence of the fundamental band-gap energy of crystalline silicon. However, whereas the latter decreases monotonically for increasing temperature, a maximum is observed at around 125 K for the conduction-band offset together with a corresponding minimum for the valence-band offset. The results are discussed with the conclusion that for the samples studied here, the electrical band gap in porous silicon is of a molecular nature and cannot be related to quantum-confinement properties of nanocrystals of elemental silicon.

  • Received 26 February 1998

DOI:https://doi.org/10.1103/PhysRevB.58.8020

©1998 American Physical Society

Authors & Affiliations

J. T. Frederiksen, P. G. Melcher, and E. Veje

  • Oersted Laboratory, Niels Bohr Institute, Universitetsparken 5, DK-2100 Copenhagen, Denmark

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Vol. 58, Iss. 12 — 15 September 1998

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