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Ultrathin magnetic films: Electrochemistry versus molecular-beam epitaxy

W. Schindler and J. Kirschner
Phys. Rev. B 55, R1989(R) – Published 15 January 1997
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Abstract

Ultrathin Co films have been electrodeposited on Cu(001) from an aqueous Na2SO4/CoSO4 electrolyte under cleanliness conditions equivalent to ultrahigh vacuum of 5×1010 mbar. Films thicker than 1.5 ML show in-plane magnetization and square hysteresis loops. The saturation magnetization increases linearly with film thickness. The magnetization vanishes below 1.5 ML in agreement with molecular-beam epitaxy (MBE) films at 300 K. The coercivity varies approximately linearly with film thickness and is ten times larger than usually observed in MBE-grown Co. ``Magnetically dead'' layers have not been found.

  • Received 26 August 1996

DOI:https://doi.org/10.1103/PhysRevB.55.R1989

©1997 American Physical Society

Authors & Affiliations

W. Schindler and J. Kirschner

  • Max-Planck-Institut für Mikrostrukturphysik, Weinberg 2, 06120 Halle, Germany

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Vol. 55, Iss. 4 — 15 January 1997

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