Length mismatch in random semiconductor alloys. III. Crystalline and amorphous SiGe

Normand Mousseau and M. F. Thorpe
Phys. Rev. B 46, 15887 – Published 15 December 1992
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Abstract

In the third paper of this series on the length mismatch problem, we study binary semiconductor alloys in both their crystalline and amorphous forms. We have concentratred on SiGe alloys. Applying the theory developed in paper I, we obtain the mean length for both nearest and next-nearest neighbors as well as the nearest-neighbor length distribution for the crystalline alloy. We show that the theoretical results fall within the limits set by experiment. We check our analytical results against computer simulations. We examine the effect of amorphization on the internal strain, using the Wooten, Winer, and Weaire model, and find that the disorders due to the length mismatch and due to amorphization decouple.

  • Received 26 May 1992

DOI:https://doi.org/10.1103/PhysRevB.46.15887

©1992 American Physical Society

Authors & Affiliations

Normand Mousseau and M. F. Thorpe

  • Department of Physics and Astronomy, Michigan State University, East Lansing, Michigan 48824
  • Center for Fundamental Materials Research, Michigan State University, East Lansing, Michigan 48824

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Vol. 46, Iss. 24 — 15 December 1992

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