Interference photoconductivity and photoelectromagnetic effect in amorphous silicon

Vincenzo Augelli, Roberto Murri, and Marian Nowak
Phys. Rev. B 39, 8336 – Published 15 April 1989
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Abstract

The existence of the so-called interference photoconductivity (PC) and photoelectromagnetic (PEM) effects in the investigated thin films of a-Si:H,F is shown. These effects appear due to interference of radiation in a sample. In this paper, the fitting of interference PC and PEM responses to theoretical relationships is presented. Values of carrier lifetime, diffusion length, and surface recombination velocity have been estimated. Spectral dependences of individual quantum efficiency coefficients for PC and PEM effects can give information about energy distribution and type of electronic states in the investigated samples. Influence of radiation intensity on optical and recombination parameters of the material is shown.

  • Received 8 July 1988

DOI:https://doi.org/10.1103/PhysRevB.39.8336

©1989 American Physical Society

Authors & Affiliations

Vincenzo Augelli and Roberto Murri

  • Dipartimento di Fisica, Università degli Studi di Bari, via Amendola 173, I-70126 Bari, Italy

Marian Nowak

  • Institute of Physics, Silesian Technical University, PL-44-100 Gliwice, Poland

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Issue

Vol. 39, Iss. 12 — 15 April 1989

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