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Bonding and structure of CoSi2 and NiSi2

J. Tersoff and D. R. Hamann
Phys. Rev. B 28, 1168(R) – Published 15 July 1983
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Abstract

Self-consistent calculations of the electronic structure of CoSi2 and NiSi2 give insight into the nature of the bonding and suggest an explanation of the unique structure of these two compounds. A quasigap separates bonding and antibonding states. For CoSi2 and NiSi2, EF falls in or near the quasigap. The Si atoms exhibit sp3 hybridization, absent in many other silicides. Ionicity is negligible. Bonding is well described by a directed valence-orbital picture, except for free-electron (interstitial) character at higher energies.

  • Received 25 April 1983

DOI:https://doi.org/10.1103/PhysRevB.28.1168

©1983 American Physical Society

Authors & Affiliations

J. Tersoff and D. R. Hamann

  • Bell Laboratories, Murray Hill, New Jersey 07974

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Issue

Vol. 28, Iss. 2 — 15 July 1983

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