Magnetic and electronic properties of Ni films, surfaces, and interfaces

J. Tersoff and L. M. Falicov
Phys. Rev. B 26, 6186 – Published 1 December 1982
PDFExport Citation

Abstract

Results of various calculations lead to a unified understanding of the magnetic behavior of thin nickel films. We thus explain disparate experimental results. We report results for magnetic and electronic properties of Ni films of one to five atomic layers on Cu (100) and (111), of the Ni-Cu (100) and (111) interfaces, and of the Ni (100) and (111) surfaces. Results are in good agreement with the few published calculations. We find that magnetization is suppressed at the Ni-Cu interface, but enhanced in isolated thin films. The net effect of this competition is that a Ni monolayer is substantially magnetic on Cu(100) but paramagnetic (or nearly so) on Cu(111). Film magnetization is found to be very sensitive to substrate composition. For substrates which couple strongly to the Ni film, ferromagnetism first appears at about three atomic layer Ni, in quantitative agreement with experiments based on Al and Pb-Bi substrates. The crucial mechanism acting to suppress Ni magnetization is spd hybridization, just as in most Ni alloys.

  • Received 17 June 1982

DOI:https://doi.org/10.1103/PhysRevB.26.6186

©1982 American Physical Society

Authors & Affiliations

J. Tersoff* and L. M. Falicov

  • Materials and Molecular Research Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 and Department of Physics, University of California, Berkeley, California 94720

  • *Present address: Bell Laboratories, Murray Hill, NJ 07974.

References (Subscription Required)

Click to Expand
Issue

Vol. 26, Iss. 11 — 1 December 1982

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×