Electronic structure of vanadium silicides

O. Bisi and L. W. Chiao
Phys. Rev. B 25, 4943 – Published 15 April 1982
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Abstract

The first electronic-band calculation for VSi2, the phase produced by the interface reaction between silicon and vanadium, has been performed using a linear combination of atomic orbitals approach in the extended Hückel approximation. The A 15 compound, V3Si, also has been investigated. The chemical bond in both compounds is found to be determined mainly by the pd (Si-V) interaction. The dd (V-V) interaction is also important in determining the physical properties of the compound. These interactions increase in strength with the metal concentration. The small charge transfer found in these compounds indicates a metallic bond picture. These results are used to interpret spectroscopic measurements of ultraviolet and synchrotron-radiation photoemission.

  • Received 10 December 1981

DOI:https://doi.org/10.1103/PhysRevB.25.4943

©1982 American Physical Society

Authors & Affiliations

O. Bisi* and L. W. Chiao

  • IBM T. J. Watson Research Center, Yorktown Heights, New York 10598

  • *Permanent address: Institute of Physics, 41100 Modena, Italy.
  • Permanent address: Department of Physics, Georgetown University, Washington, D. C. 20057.

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Issue

Vol. 25, Iss. 8 — 15 April 1982

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