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Interface magnetization: Cu films on Ni(100)

J. Tersoff and L. M. Falicov
Phys. Rev. B 25, 2959(R) – Published 15 February 1982
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Abstract

Results of a self-consistent tight-binding calculation for one and two atomic layers of Cu on ferromagnetic Ni(100) show a Cu-induced moment reduction of about 0.33 and 0.13μB per atom in the first and second Ni layers, respectively. The Cu d orbitals play almost no role. Even a single layer of Cu gives an almost ideal (surface-insensitive) interface behavior in the Ni, so spin-polarized interface states should be easily observable by photoemission.

  • Received 20 November 1981

DOI:https://doi.org/10.1103/PhysRevB.25.2959

©1982 American Physical Society

Authors & Affiliations

J. Tersoff and L. M. Falicov

  • Materials and Molecular Research Division, Lawrence Berkeley Laboratory, Berkeley, California 94720
  • Department of Physics, University of California, Berkeley, California 94720

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Vol. 25, Iss. 4 — 15 February 1982

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