Significantly enhanced tunneling electroresistance in two-dimensional ferroelectric tunnel junctions realized by reversible Schottky-Ohmic contact switching

Guogang Liu, Zhonghui Xu, Xianbo Xiao, and San-Huang Ke
Phys. Rev. B 109, 155418 – Published 15 April 2024

Abstract

Achieving large tunneling electroresistance (TER) is the key to the application of two-dimensional (2D) ferroelectric tunnel junctions (FTJs) in high-density memory devices. In this work, we show that an aided layer of 2D metal materials with ultrahigh work function can lead to significantly enhanced TER effect in 2D FTJs. To implement the idea, we design a 2D van der Waals heterostructure consisting of a metallic NbS2 monolayer and a Sc2CO2 ferroelectric, and propose a FTJ based on this heterostructure. By performing density functional theory and nonequilibrium Green's function method calculations, we find that the type of interfacial contact in the NbS2/Sc2CO2 heterostructure can be flexibly switched between Ohmic and Schottky contact by altering the ferroelectric polarization. Accordingly, the NbS2/Sc2CO2-based FTJ exhibit giant TER ratio of up to 1013%, and its TER ratio increases with the tunneling barrier length. These findings not only provide a feasible strategy for realizing large TER effect in 2D FTJs, but also offer promising candidates to designing nonvolatile memories.

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  • Received 18 December 2023
  • Revised 7 March 2024
  • Accepted 2 April 2024

DOI:https://doi.org/10.1103/PhysRevB.109.155418

©2024 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Guogang Liu1, Zhonghui Xu2, Xianbo Xiao3, and San-Huang Ke1,*

  • 1MOE Key Laboratory of Microstructured Materials, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
  • 2School of Science, Jiangxi University of Science and Technology, Ganzhou 341000, China
  • 3School of Computer Science, Jiangxi University of Chinese Medicine, Nanchang 330004, China

  • *shke@tongji.edu.cn

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Vol. 109, Iss. 15 — 15 April 2024

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