• Open Access

Electron emission from deep traps in HfO2 under thermal and optical excitation

Roman Izmailov, Jack Strand, Nicolo' Ronchi, Alexander Shluger, and Valeri Afanas'ev
Phys. Rev. B 109, 134109 – Published 17 April 2024

Abstract

The ratio between the energies of optical and thermal ionization depends on the defect nature and the strength of the interaction of trapped electrons with phonons. Knowing this ratio for a certain type of defect allows one to predict, e.g., thermal emission energies from the optically measured values. We present the results of direct empirical extraction of the ratio between optical and thermal electron emission energies for HfO2 bulk electron traps combined with theoretical analysis of the physical mechanism of electron transitions from the trapped state to the mobility edge. We show that, by applying different excitation mechanisms, we affect the same deep traps inside the HfO2 band gap; i.e., these traps are both optically and thermally active and are likely to have similar nature. The extracted empirical optical/thermal ionization energy ratio of 2.2±0.3 is in good agreement with the polaronic nature of the probed electron traps, as shown by the results of theoretical calculations. Our results provide experimental and theoretical methodologies for consistently linking thermal and optical ionization energies of electron traps and describing their distributions in the band gap of amorphous oxides, and can help improve modeling frameworks for reliability issues related to oxide traps.

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  • Received 15 December 2023
  • Revised 21 March 2024
  • Accepted 25 March 2024

DOI:https://doi.org/10.1103/PhysRevB.109.134109

Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI.

Published by the American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Roman Izmailov1,2, Jack Strand3,4, Nicolo' Ronchi1, Alexander Shluger3,5, and Valeri Afanas'ev1,2

  • 1imec, Kapeldreef 75, 3001 Leuven, Belgium
  • 2Department of Physics and Astronomy, KU Leuven, 3001 Leuven, Belgium
  • 3Department of Physics and Astronomy, University College London, Gower Street, London WC1E 6BT, United Kingdom
  • 4Nanolayers Research Computing Ltd., London, United Kingdom
  • 5WPI–Advanced Institute for Materials Research (WPI-AIMR), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

Article Text

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Issue

Vol. 109, Iss. 13 — 1 April 2024

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