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High quality electron bunch generation using a longitudinal density-tailored plasma-based accelerator in the three-dimensional blowout regime

X. L. Xu, F. Li, W. An, T. N. Dalichaouch, P. Yu, W. Lu, C. Joshi, and W. B. Mori
Phys. Rev. Accel. Beams 20, 111303 – Published 21 November 2017

Abstract

The generation of very high quality electron bunches (high brightness and low energy spread) from a plasma-based accelerator in the three-dimensional blowout regime using self-injection in tailored plasma density profiles is analyzed theoretically and with particle-in-cell simulations. The underlying physical mechanism that leads to the generation of high quality electrons is uncovered by tracking the trajectories of the electrons in the sheath that are trapped by the wake. Details on how the intensity of the driver and the density scale-length of the plasma control the ultimate beam quality are described. Three-dimensional particle-in-cell simulations indicate that this concept has the potential to produce beams with peak brightnesses between 1020 and 1021A/m2/rad2 and with absolute slice energy spreads of O(0.1)MeV using existing lasers or electron beams to drive nonlinear wakefields. We also show projected energy spreads as low as 0.3MeV for half the charge can be generated at an optimized acceleration distance.

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  • Received 4 October 2016

DOI:https://doi.org/10.1103/PhysRevAccelBeams.20.111303

Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.

Published by the American Physical Society

Physics Subject Headings (PhySH)

Accelerators & Beams

Authors & Affiliations

X. L. Xu1,*, F. Li2, W. An1, T. N. Dalichaouch1, P. Yu1, W. Lu2,3,†, C. Joshi1, and W. B. Mori1

  • 1University of California, Los Angeles, California 90095, USA
  • 2Department of Engineering Physics, Tsinghua University, Beijing 100084, China
  • 3IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240, China

  • *xinluxu11@ucla.edu
  • weilu@mail.tsinghua.edu.cn

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Vol. 20, Iss. 11 — November 2017

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