Atom lithography with near-resonant standing waves

R. Arun, Offir Cohen, and I. Sh. Averbukh
Phys. Rev. A 81, 063809 – Published 9 June 2010

Abstract

We study the optimal focusing of two-level atoms with a near-resonant standing wave light, using both classical and quantum treatments of the problem in the thin- and thick-lens regimes. It is found that the near-resonant standing wave focuses the atoms with a reduced background in comparison with far-detuned light fields. For some parameters, the quantum atomic distribution shows even better localization than the classical one. Spontaneous emission effects are included via the technique of quantum Monte Carlo wave function simulations. We investigate the extent to which nonadiabatic and spontaneous emission effects limit the achievable minimal size of the deposited structures.

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  • Received 1 April 2010

DOI:https://doi.org/10.1103/PhysRevA.81.063809

©2010 American Physical Society

Authors & Affiliations

R. Arun, Offir Cohen, and I. Sh. Averbukh

  • Department of Chemical Physics, The Weizmann Institute of Science, Rehovot 76100, Israel

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Issue

Vol. 81, Iss. 6 — June 2010

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