Abstract
As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.
- Received 2 November 2000
DOI:https://doi.org/10.1103/PhysRevA.63.063407
©2001 American Physical Society
