Abstract
We have investigated the effect of static uniaxial compression along the [001], [110], and [111] directions on the , , , and electroreflectance peaks of Ge and GaAs, and the electroreflectance peaks of Si. From the stress-induced splittings and shifts of the , peaks of Ge and GaAs, the hydrostatic and shear deformation potentials of the k=0 valence-band maximum have been determined. We have also observed a nonlinear stress dependence of the energies of these peaks, which is caused by the stress-induced coupling between the upper stress-split valence band and the spin-orbit split band. A theory for the stress-induced variations in intensity caused by this interaction will be presented and compared with the experimental results. The hydrostatic and shear deformation potentials of the -conduction and -valence bands of Ge and GaAs have been determined from the stress dependence of the and peaks of these materials. We have attributed the observed stress-induced changes in intensity of these peaks to the intraband splitting of the -orbital valence bands. The experimental results are compared with our theoretical calculations. The stress dependence of the electroreflectance peaks of Si for [001] stress seems to indicate that [100] critical points are responsible for this structure. However, we have also observed large polarization-dependent intensity changes for [111] stress, which we have not been able to explain on the basis of the above assignment.
- Received 4 December 1967
DOI:https://doi.org/10.1103/PhysRev.172.816
©1968 American Physical Society