Atomic Dipole Moment Distribution of Si Atoms on a Si(111)(7×7) Surface Studied Using Noncontact Scanning Nonlinear Dielectric Microscopy

Yasuo Cho and Ryusuke Hirose
Phys. Rev. Lett. 99, 186101 – Published 1 November 2007

Abstract

A local atomic electric dipole moment distribution of Si atoms on Si(111)(7×7) surface is clearly resolved by using a new technique called noncontact scanning nonlinear dielectric microscopy. The dc-bias voltage dependence of the atomic dipole moment on the Si(111)(7×7) surface is measured. At the weak applied voltage of 0.5V, a positive dipole moment is detected on the Si adatom sites, whereas a negative dipole moment is observed at the interstitial sites of inter Si adatoms. Moreover, the quantitative dependence of the surface dipole moment as a function of the applied dc voltage is also revealed at a fixed point above the sample surface. This is the first successful demonstration of direct atomic dipole moment observation achieved in the field of capacitance measurement.

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  • Received 21 April 2007

DOI:https://doi.org/10.1103/PhysRevLett.99.186101

©2007 American Physical Society

Authors & Affiliations

Yasuo Cho* and Ryusuke Hirose

  • Research Institute of Electrical Communication, Tohoku University 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

  • *Corresponding author. cho@riec.tohoku.ac.jp

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Issue

Vol. 99, Iss. 18 — 2 November 2007

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