Enhancement of Carrier Mobility in Semiconductor Nanostructures by Dielectric Engineering

Debdeep Jena and Aniruddha Konar
Phys. Rev. Lett. 98, 136805 – Published 30 March 2007

Abstract

We propose a technique for achieving large improvements in carrier mobilities in 2- and 1-dimensional semiconductor nanostructures by modifying their dielectric environments. We show that by coating the nanostructures with high-κ dielectrics, scattering from Coulombic impurities can be strongly damped. Though screening is also weakened, the damping of Coulombic scattering is much larger, and the resulting improvement in mobilities of carriers can be as much as an order of magnitude for thin 2D semiconductor membranes, and more for semiconductor nanowires.

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  • Received 28 September 2006

DOI:https://doi.org/10.1103/PhysRevLett.98.136805

©2007 American Physical Society

Authors & Affiliations

Debdeep Jena1 and Aniruddha Konar2

  • 1Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA
  • 2Department of Physics, University of Notre Dame, Notre Dame, Indiana 46556, USA

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Issue

Vol. 98, Iss. 13 — 30 March 2007

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