Coexistence of Localized and Delocalized Surface Plasmon Modes in Percolating Metal Films

K. Seal, D. A. Genov, A. K. Sarychev, H. Noh, V. M. Shalaev, Z. C. Ying, X. Zhang, and H. Cao
Phys. Rev. Lett. 97, 206103 – Published 17 November 2006

Abstract

Near-field intensity statistics in semicontinuous silver films over a wide range of surface coverage are investigated using near-field scanning optical microscopy. The variance of intensity fluctuations and the high-order moments of intensity enhancement exhibit local minima at the percolation threshold. This reduction in local field fluctuations results from resonant excitation of delocalized surface plasmon modes. By probing the modification of the critical indices for high-order moments of intensity enhancement caused by the delocalized states, we provide the first experimental evidence for the coexistence of localized and delocalized surface plasmon modes in percolating metal films.

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  • Received 30 March 2006

DOI:https://doi.org/10.1103/PhysRevLett.97.206103

©2006 American Physical Society

Authors & Affiliations

K. Seal1, D. A. Genov2, A. K. Sarychev3, H. Noh1, V. M. Shalaev4, Z. C. Ying5, X. Zhang2, and H. Cao1

  • 1Department of Physics and Astronomy, Northwestern University, Evanston, Illinois 60208, USA
  • 2NSF Nanoscale Science and Engineering Center, University of California–Berkeley, Berkeley, California 94720, USA
  • 3Ethertronics, Inc., 9605 Scranton Road, Suite 850, San Diego, California 92121, USA
  • 4School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, USA
  • 5Division of Materials Research, National Science Foundation, Arlington, Virginia 22230, USA

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Issue

Vol. 97, Iss. 20 — 17 November 2006

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