Oxygen-Deficient Line Defects in an Ultrathin Aluminum Oxide Film

M. Schmid, M. Shishkin, G. Kresse, E. Napetschnig, P. Varga, M. Kulawik, N. Nilius, H.-P. Rust, and H.-J. Freund
Phys. Rev. Lett. 97, 046101 – Published 24 July 2006

Abstract

A model for the straight antiphase domain boundary of the ultrathin aluminum oxide film on the NiAl(110) substrate is derived from scanning tunneling microscopy measurements and density-functional theory calculations. Although the local bonding environment of the perfect film is maintained, the structure is oxygen deficient and possesses a favorable adsorption site. The domain boundary exhibits a downwards band bending and three characteristic unoccupied electronic states, in excellent agreement with scanning tunneling spectroscopy measurements.

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  • Received 31 January 2006

DOI:https://doi.org/10.1103/PhysRevLett.97.046101

©2006 American Physical Society

Authors & Affiliations

M. Schmid1, M. Shishkin2, G. Kresse2,*, E. Napetschnig1, P. Varga1, M. Kulawik3, N. Nilius3, H.-P. Rust3, and H.-J. Freund3

  • 1Institut für Allgemeine Physik, Technische Universität Wien, A 1040 Wien, Austria
  • 2Institut für Materialphysik and Centre for Computational Materials Science, Universität Wien, A 1090 Wien, Austria
  • 3Fritz-Haber Institut der MPG, Faradayweg 4-6, D 14195 Berlin, Germany

  • *Corresponding author. Electronic address: georg.kresse@univie.ac.at

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Issue

Vol. 97, Iss. 4 — 28 July 2006

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