Voltage-Induced Metal-Insulator Transition in Polythiophene Field-Effect Transistors

A. S. Dhoot, G. M. Wang, D. Moses, and A. J. Heeger
Phys. Rev. Lett. 96, 246403 – Published 20 June 2006

Abstract

We have extensively studied the carrier transport in regio-regular polythiophene field-effect transistors (FETs) from room temperature to 4.2 K. At low temperatures, Zabrodskii plots (dlnσ/dlnT) demonstrate that the gate voltage and source-drain voltage combine to induce the insulator-to-metal transition at a carrier density of 5×1012cm2. The carrier transport in the insulating regime is well described by phonon assisted hopping in a disordered Fermi glass with Coulomb interaction between the hopping charge carrier and the opposite charge left behind, as described by Efros and Shklovskii.

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  • Received 6 January 2006

DOI:https://doi.org/10.1103/PhysRevLett.96.246403

©2006 American Physical Society

Authors & Affiliations

A. S. Dhoot, G. M. Wang, D. Moses, and A. J. Heeger

  • Center for Polymers and Organic Solids and Mitsubishi Chemical Center for Advanced Materials, University of California, Santa Barbara, California 93106, USA

Comments & Replies

Comment on “Voltage-Induced Metal-Insulator Transition in Polythiophene Field-Effect Transistors”

Vladimir N. Prigodin and Arthur J. Epstein
Phys. Rev. Lett. 98, 259703 (2007)

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Vol. 96, Iss. 24 — 23 June 2006

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