Bichromatic Microwave Photoresistance of a Two-Dimensional Electron System

M. A. Zudov, R. R. Du, L. N. Pfeiffer, and K. W. West
Phys. Rev. Lett. 96, 236804 – Published 13 June 2006

Abstract

We explore experimentally bichromatic (frequencies ω1 and ω2) photoresistance of a two-dimensional electron system in the regimes of microwave-induced resistance oscillations and zero-resistance states. We find bichromatic resistance to be well described by a superposition of ω1 and ω2 components, provided that both monochromatic resistances are positive. This relation holds even when the oscillation amplitudes are small and one could expect additive contributions from monochromatic photoresistances. In contrast, whenever a zero-resistance state is formed by one of the frequencies, such superposition relation breaks down and the bichromatic resistance is strongly suppressed.

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  • Received 27 March 2006

DOI:https://doi.org/10.1103/PhysRevLett.96.236804

©2006 American Physical Society

Authors & Affiliations

M. A. Zudov1,2, R. R. Du1,3, L. N. Pfeiffer4, and K. W. West4

  • 1Department of Physics, University of Utah, Salt Lake City, Utah 84112, USA
  • 2School of Physics and Astronomy, University of Minnesota, Minneapolis, Minnesota 55455, USA
  • 3Department of Physics and Astronomy, Rice University, Houston, Texas 77005, USA
  • 4Bell Laboratories, Lucent Technologies, Murray Hill, New Jersey 07974, USA

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Issue

Vol. 96, Iss. 23 — 16 June 2006

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