Diffusion Dynamics during the Nucleation and Growth of Ge/Si Nanostructures on Si(111)

F. Ratto, A. Locatelli, S. Fontana, S. Kharrazi, S. Ashtaputre, S. K. Kulkarni, S. Heun, and F. Rosei
Phys. Rev. Lett. 96, 096103 – Published 8 March 2006
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Abstract

We report a low energy electron microscopy study of the relation between self-organized Ge/Si(111) nanostructures and their local environment. By comparison with Monte Carlo simulations, three-dimensional islands are shown to display a substantial tendency towards self-ordering. This tendency may result from the diffusive nature of the nucleation processes. The size of individual nanostructures does not significantly correlate with the distance between neighboring islands. Thus energetic factors are thought to govern the competition among coexisting nanostructures to capture the deposited mass.

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  • Received 17 November 2005

DOI:https://doi.org/10.1103/PhysRevLett.96.096103

©2006 American Physical Society

Authors & Affiliations

F. Ratto1,*,†, A. Locatelli2, S. Fontana2, S. Kharrazi3, S. Ashtaputre3, S. K. Kulkarni3, S. Heun4, and F. Rosei1,*,‡

  • 1INRS Energie, Matériaux et Télécommunications, Université du Québec, 1650 Boulevard Lionel Boulet, J3X 1S2 Varennes (QC), Canada
  • 2Sincrotrone Trieste SCpA, SS 14 Km 163.5, 34012 Basovizza, Italy
  • 3DST Unit on Nanoscience, Physics Department, University of Pune, Pune 411007, India
  • 4Laboratorio Nazionale TASC-INFM-CNR, Area Science Park, SS 14 Km 163.5, 34012 Basovizza, Italy

  • *To whom correspondence should be addressed.
  • Electronic address: ratto@emt.inrs.ca
  • Electronic address: rosei@emt.inrs.ca

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Issue

Vol. 96, Iss. 9 — 10 March 2006

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