Electron-Beam-Induced Disordering of the Si(001)c(4×2) Surface Structure

Tetsuroh Shirasawa, Seigi Mizuno, and Hiroshi Tochihara
Phys. Rev. Lett. 94, 195502 – Published 16 May 2005

Abstract

An electron beam (EB) irradiation effect on the Si(001)c(4×2) surface was investigated by using low-energy electron diffraction. Quarter-order spots become dim and streaky by EB irradiation below 40K, indicating a disordering in the c(4×2) arrangement of buckled dimers. A quantitative analysis of decreasing rates of the spot intensity at various conditions of beam current, beam energy, and substrate temperature leads to a proposal for a mechanism of the disordering in the buckled-dimer arrangement in terms of electronic excitation, electron-phonon coupling, and carrier concentration.

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  • Received 22 October 2004

DOI:https://doi.org/10.1103/PhysRevLett.94.195502

©2005 American Physical Society

Authors & Affiliations

Tetsuroh Shirasawa1, Seigi Mizuno1,2, and Hiroshi Tochihara1

  • 1Department of Molecular and Material Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
  • 2PRESTO, Japan Science and Technology Agency, 4-1-8 Honcho Kawaguchi, Saitama, Japan

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Issue

Vol. 94, Iss. 19 — 20 May 2005

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