Compressive Stress in Polycrystalline Volmer-Weber Films

R. Koch, Dongzhi Hu, and A. K. Das
Phys. Rev. Lett. 94, 146101 – Published 12 April 2005

Abstract

The Volmer-Weber mode for growing polycrystalline films, which comprises island, network, and channel stages before the films become continuous, is well known for its complex stress behavior with compressive and tensile stress alternating in the initial three growth stages. Recently, two new mechanisms for the compressive stress have been proposed [Phys. Rev. Lett. 88, 156103 (2002); 89, 126103 (2002)], which account for the reversibility of stress generation and relaxation. We show that the two mechanisms play only minor roles for the development of compressive stress, which is confirmed to be due to capillarity effects in the precoalescence stage.

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  • Received 28 September 2004

DOI:https://doi.org/10.1103/PhysRevLett.94.146101

©2005 American Physical Society

Authors & Affiliations

R. Koch, Dongzhi Hu, and A. K. Das

  • Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, D-10117 Berlin, Germany

Comments & Replies

Koch, Hu, and Das Reply:

R. Koch, Dongzhi Hu, and A. K. Das
Phys. Rev. Lett. 95, 229602 (2005)

Comment on “Compressive Stress in Polycrystalline Volmer-Weber Films”

Cody Friesen and Carl V. Thompson
Phys. Rev. Lett. 95, 229601 (2005)

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Vol. 94, Iss. 14 — 15 April 2005

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