Phosphine Dissociation on the Si(001) Surface

H. F. Wilson, O. Warschkow, N. A. Marks, S. R. Schofield, N. J. Curson, P. V. Smith, M. W. Radny, D. R. McKenzie, and M. Y. Simmons
Phys. Rev. Lett. 93, 226102 – Published 23 November 2004

Abstract

Density functional calculations are performed to identify features observed in STM experiments after phosphine (PH3) dosing of the Si(001) surface. On the basis of a comprehensive survey of possible structures, energetics, and simulated STM images, three prominent STM features are assigned to structures containing surface bound PH2, PH, and P, respectively. Collectively, the assigned features outline for the first time a detailed mechanism of PH3 dissociation and P incorporation on Si(001).

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  • Received 11 June 2004

DOI:https://doi.org/10.1103/PhysRevLett.93.226102

©2004 American Physical Society

Authors & Affiliations

H. F. Wilson1, O. Warschkow1, N. A. Marks1, S. R. Schofield2,3, N. J. Curson3, P. V. Smith2, M. W. Radny2, D. R. McKenzie1, and M. Y. Simmons3

  • 1Centre for Quantum Computer Technology, School of Physics, The University of Sydney, Sydney 2006, NSW Australia
  • 2School of Mathematical and Physical Sciences, The University of Newcastle, Callaghan 2308, NSW Australia
  • 3Centre for Quantum Computer Technology, School of Physics, University of New South Wales, Sydney 2052, NSW, Australia

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Issue

Vol. 93, Iss. 22 — 26 November 2004

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