Strain Induced Deep Electronic States around Threading Dislocations in GaN

L. Lymperakis, J. Neugebauer, M. Albrecht, T. Remmele, and H. P. Strunk
Phys. Rev. Lett. 93, 196401 – Published 1 November 2004

Abstract

Combining through-focus high-resolution transmission electron microscopy and hierarchical multiscale simulations consisting of density-functional theory, analytical empirical potentials, and continuum elastic theory we demonstrate the existence of a new dislocation type in GaN. In contrast with all previously identified or suggested dislocation structures in GaN, all core atoms are fully coordinated; i.e., no broken bonds occur, implying that the dislocation should be electrically inactive. However, as we show, the giant local strain-field around the dislocation core, in combination with the small lattice constant of GaN, causes deep defect states and thus electrically active edge dislocations independent on the specific core structure.

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  • Received 22 August 2003

DOI:https://doi.org/10.1103/PhysRevLett.93.196401

©2004 American Physical Society

Authors & Affiliations

L. Lymperakis and J. Neugebauer*

  • Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin (Dahlem), Germany
  • Fakultät für Naturwissenschaften, Universität Paderborn, Fachbereich 6-Physik, D-33095 Paderborn, Germany

M. Albrecht, T. Remmele, and H. P. Strunk

  • Institut für Werkstoffwissenschaften, Universität Erlangen-Nürnberg, Mikrocharakteriserung, Cauerstrasse 6, D-91058 Erlangen, Germany

  • *Electronic address: neugebauer@fhi-berlin.mpg.de

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Issue

Vol. 93, Iss. 19 — 5 November 2004

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